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China's SiCarrier unveils DUV technology for 5nm chip production advancements

China's SiCarrier is set to unveil products this week, aiming for breakthroughs in 5nm chip production using deep ultraviolet (DUV) lithography and self-aligned quadruple patterning (SAQP) technology. This development follows a patent for 5nm chips linked to Huawei's Mate 60 Pro, showcasing tools named after famous mountains.While SiCarrier's debut has garnered attention among domestic chipmakers, its ability to commercialize lithography machines for nodes older than 28nm remains uncertain. Concurrently, China is reportedly advancing its homegrown extreme ultraviolet (EUV) lithography systems, with trials expected by 2025.
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